中国国务院总理李强于7月23日签署国务院令，公布修订后的《集成电路布图设计保护条例》，该条例将自10月15日起施行[1]。
新版条例的核心创新是引入"独创性声明"制度[1]。这一制度将抽象的独创性判断标准转化为可审查的书面文件，并要求提交的复制件或图样应清楚显示布图设计的独创性部分[1]。通过建立这一法定登记文件，条例解决了保护范围难以确定的问题[1]。
此外，新版条例进一步加强了专有权保护，明确了权利范围界定标准，并加大了侵权赔偿力度[1]。
China's State Council has issued updated regulations governing the protection of integrated circuit layout designs, marking a significant overhaul of intellectual property safeguards in the semiconductor sector.[1] Premier Li Qiang signed the State Council order on July 23, 2024, with the revised Regulations on the Protection of Integrated Circuit Layout Designs taking effect on October 15, 2024.[1]
The key innovation in the new regulations is the introduction of an "originality declaration" system.[1] This mechanism converts abstract originality standards into reviewable written documents, addressing longstanding difficulties in determining the scope of protection.[1] Under the new framework, applicants must submit copies or drawings that clearly demonstrate the original elements of the layout design.[1] The regulations also strengthen exclusive rights protection by establishing clearer standards for defining the scope of rights and increasing penalties for infringement.[1]